Our Strategic Mission

"Chemical Abatement Technology is committed to design simplicity, robust construction, and low cost chemical abatement equipment and service solutions for the semiconductor industry."

Our Company Mission

Chemical Abatement Technology was formed in 1996 by two engineers with thirty years of chemical engineering experience in the semiconductor industry. We are focused on developing semiconductor and other process gas exhaust management solutions. We have developed several patented products that are innovative rather than conventional "me too" products.

Our RPM-12 point-of-use scrubber replaces typical packed bed spray columns with a rotary element. The rotary element creates turbulent mixing and efficient abatement by moving the media through the exhaust gas rather than moving the exhaust gas through the media. This design simplicity allows the RPM-12 to be housed in a compact 2 foot cube, to use water once instead of recirculating, and to mechanically clean the gas inlet, while achieving one of the lowest installed cost levels in the industry.

Our RPM-18 fume scrubber is designed to meet the exhaust treatment requirements of a wide variety of commercial and industrial applications. It has the same operating design and compact footprint as the RPM-12, but at a lower cost. Current applications include chemical repack operations, acid and ammonia exhaust abatement, and food service and pharmaceutical clients.

Our patented Silanator™ system destroys silane without burning, or generating any particulate SiO2, at a much lower installed cost than typical burner/oxidizer systems.

Why Choose Us?

We have three decades of experience in semiconductor chemical facilities management. We build our equipment with the best materials and components available. We design our equipment to be easily maintained. By adhering to the principles of design simplicity and robust components, we deliver low cost chemical abatement solutions that work.